电子、能源、新材料工业水处理
Electronic, energy, new material industrial water treatment
- 半导体材料、晶元材料生产、加工、清洗用水 
- 晶体管生产中主要用于清洗硅片用水 
- 液晶显示器的生产、屏面需用纯水清洗和配液用水 
- 电子管生产、电子管阴极涂敷碳酸盐配液用水 
- 集成电路生产中高纯水清洗硅片用水 
- 电解电容器生产铝箔及工作件的洗 
- 显像管和阴极射线管生产、配料用纯水 
- 实验室和中试车间用水 
- 光电产品、其他高精微高要求产品用水 

- Water for production, processing and cleaning of semiconductor materials and crystalline materials 
- Water for silicon wafer cleaning in transistor production 
- The production and screen of LCD need pure water for cleaning and liquid distribution 
- Water for production of electron tube and coating of cathode of electron tube with carbonate solution 
- Water for cleaning silicon wafer with high purity water in IC production 
- Production of aluminum foil and cleaning of working parts for electrolytic capacitor 
- Pure water for production and batching of CRT and CRT 
- Water for laboratory and pilot plant 
- Water for photoelectric products and other products with high precision and high requirements 

基本工艺:预处理-RO-EDI(DI)-抛光混床 basic process: pre-RO-sterilization

 
                         
            